Synthesis of GaN by electrochemical method at low temperature

Authors

  • S. El-Safty National Institute for Materials Science (NIMS), Research Center for Functional Materials, 1-2-1 Sengen, Tsukuba-shi, Ibaraki-ken, 305-0047, Japan Author
  • Y. Hayashi Graduate School of Natural Science and Technology, Okayama University, Okayama, 700-8530, Japan Author

DOI:

https://doi.org/10.56053/6.3.63

Keywords:

GaN, Electrochemical, Temperature

Abstract

The growth of GaN thin films using this technique is still a challenge. According to our knowledge, up to now there are limited theoretical and experimental studies on ECD of GaN [7,8].  In our previous work we presented a synthesis of GaN thin film using a simple and low-cost ECD on n-Si (1 1 1) substrates and for the first time below room temperature at 20 oC using different current densities and constant deposition duration. In order to have a deeper insight on the growth mechanism of GaN films by ECD, study on the effects of deposition time is desirable.

References

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Published

2022-07-15

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Articles

How to Cite

Synthesis of GaN by electrochemical method at low temperature. (2022). Experimental and Theoretical NANOTECHNOLOGY, 6(3), 63-68. https://doi.org/10.56053/6.3.63