Fabrication and characterization of titanium dioxide thin films with various temperatures fabrication via sol-gel technique
DOI:
https://doi.org/10.56053/10.2.795Keywords:
Optical, TiO2, Sol-gel, ElectricalAbstract
Titanium dioxide films TiO2 have been deposited by dip-coating technique with different temperatures 300, 350, and 400 oC. The objective of this work is to study of the characterization of TiO2 thin films under different temperatures. The films are synthesized by dip-coating technique and examined by X-ray diffraction (XRD). Hall effect is performed to measure the electrical properties of the samples. The results obtained by XRD confirm the formation of TiO2 films with a tetragonal structure and crystallite size varies from (15.0 – 5.1) nm. Deposited films with resistivity vary of (130 to 60) Ω.cm, figure of merite varies from (1.78×10-8 to 3.93×10-8) (Ω/sq)-1 respectively. Optical band gap and urbach energy (3.35 – 3.22 and 0.42 – 0.37) eV, all the values at 550 nm have been obtained.
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