Si-doped polycrystalline via chemical deposition . Experimental and Theoretical NANOTECHNOLOGY, [S. l.], v. 3, n. 3, p. 253–268, 2019. DOI: 10.56053/3.3.253. Disponível em: https://etnano.com/index.php/journal/article/view/84.. Acesso em: 22 dec. 2024.