Characterization and analysis of GaN

Authors

  • D. Kadir Department of Physics, University of Abou Bakr Belkaïd, Tlemcen – 13000, Algeria
  • A. Benoi Laboratoire de Mécanique des Solides Institut Naitonal des Sciecnes Appliquées Bat. 304. 69621 Villeurbanne France
  • S. Delon Laboratoire de Mécanique des Solides Institut Naitonal des Sciecnes Appliquées Bat. 304. 69621 Villeurbanne France

DOI:

https://doi.org/10.56053/3.1.33

Keywords:

GaN, Optical properties

Abstract

Electrochemical deposition method is used to prepare GaN thin films. The morphological studies using scanning electron microscopy (SEM) and analysis of photoluminescence (PL) within the refractive index and optical dielectric constant are investigated experimentally and theoretically, respectively. These investigations are found to be dependent on the growth time. The nanosize effect is noticed for sensors applications. Our calculated results agree with experimental and theoretical data.

References

-[1] B. Ha, S.H. Seo, J.H. Cho, C.S. Yoon, J. Yoo, G.C. Yi, C.Y. Park, C.J. Lee, J. Phys. Chem. B 109 (2005) 11095

-[2] N. E. Christensen, I. Gorczyca, Phys. Rev. B 50 (1994) 4397

-[3] K. Lawniczak-Jablonska, T. Suski and I. Gorczyca, N. E. Christensen, K. E. Attenkofer, R. C. C. Perera, E. M. Gullikson, J. H. Underwood, D. L. Ederer, Z. Liliental Weber, Phys. Rev. B 61 (2000) 16623

-[4] Ahmed M. A. Hassan, Moustafa Ahmed, M. Nakahama, Fumio Koyama, Exp. Theo. NANOTECHNOLOGY 2 (2018) 91

-[5] Y. Al-Douri, J. Appl. Phys. 93 (2003) 9730

-[6] H. Amano, T. Tanaka, Y. Kunii, K. Kato, S.T. Kim, I. Akasaki, J. Appl. Phys. Lett. 64 (1994) 1377

-[7] S.A. Nikishin, N.N. Faleev, V.G. Antipov, S. Francoeur, L. Grave de Peralta, G.A. Seryogin, H. Temkin, T.I. Prokofyeva, M. Holtz, S.N.G. Chu, J. Appl. Phys. Lett. 75 (1999) 2073

-[8] J. Jasinski, W. Swider, Z. Liliental-Weber, P. Visconti, K.M. Jones, M.A. Reshchikov, F. Yun, H. Morkoc- , S.S. Park, K.Y. Lee, J. Appl. Phys. Lett. 78 (2001) 2297

-[9] E. Nahlah, R.S. Srinivasa, S. Major, S.C. Sabharwal, K.P. Muthe, Thin Solid

Films 333 (1998) 9

-[10] J. Katayama, M. Izaki, J. Appl. Electrochem. 30 (2000) 855.

-[11] M. Mourad Mabrook, Exp. Theo. NANOTECHNOLOGY 2 (2018) 103

-[12] C. D. S. Brites, P. P. Lima, N. J. O. Silva, A. Millán, V. S. Amaral, F. Palacio, L. D. Carlos, Nanoscale 4 (2012) 4799

-[13] K. Ostrikov, I. Levchenko, U. Cvelbar, M. Sunkara, M. Mozetic, Nanoscale 2 (2010) 2012

-[14] R.K. Roy, A.K. Pal, Mater. Lett. 59 (2005) 2204

-[15] K. Al-Heuseen, M.R. Hashim, N.K. Ali, Mater. Lett. 64 (2010) 1604

-[16] K. Al-Heuseen, M.R. Hashim, J. Crys. Growth 324 (2011) 274

-[17] S. Strite, H. Morkoc, J. Vac. Sci. Technol. 10 (1992) 1237

-[18] D. Vogel, P. Kruger, J. Pollmann, Phys. Rev B 55 (1997) 12836

-[19] W. R. L. Lambrecht and B. Segall, in Properties of Group II Nitrides edited by J. H. Edgar (EMIS Datareviews Series, London, 1994)

-[20] T. Detchprohm, K. Hiramatsu, K. Itoh, I. Akasaki, Jpn. J. Appl. Phys. 31 (1992) L1454

-[21] B. Abbar, B. Bouhafs, H. Aourag, G. Nouet, P. Ruterana, phys. stat. sol. (b) 228 (2001) 457

-[22] Semiconductors Physics of Group IV Elements and III-V Compounds, edited by K. H. Hellwege and O. Madelung, Landolt-Bornstein, New Series, Group III, Vol. 17, Pt. a (Springer, Berlin, 1982); Intrinsic Properties of Group IV Elements and III-V, II-VI and I-VII Compounds, edited by K. H. Hellwege and O. Madelung, Landolt-Bo¨rnstein, New Series, Group III, Vol. 22, Pt. a (Springer, Berlin, 1987)

-[23] N. M. Ravindra, S. Auluck, V. K. Srivastava, Phys. Stat. Sol. (b) 93 (1979) K155

-[24] P. J. L. Herve, L. K. J. Vandamme, J. Appl. Phys. 77 (1995) 5476

-[25] D. K. Ghosh, L. K. Samanta, G. C. Bhar, Infrared Phys. 24 (1984) 34

-[26] Handbook of optics, 3rd edition, vol. 4, McGraw Hill, (2009)

-[27] V. Bougrov, M. E. Levinshtein, S. L. Rumyantsev, A. Zubrilov, in: Properties of Advanced SemiconductorMaterials GaN, AlN, InN, BN, SiC, SiGe. Eds. M. E. Levinshtein, S. L. Rumyantsev, M. S. Shur, John Wiley & Sons, Inc., New York, 2001.

-[28] B. Deb, S. Chaudhuri, A.K. Pal, Mater. Lett. 53 (2002) 68

-[29] S.J. Rhee, S. Kim, E.E. Reuter, S.G. Bishop, R.J. Molnar, Appl. Phys. Lett. 73

(1998) 2636

-[30] N. M. Balzaretti, J. A. H. da Jornada, Solid State Commun. 99 (1996) 943

-[31] T. S. Moss, Proc. Phys. Soc. B, 63 (1950) 167

-[32] V. P. Gupta, N. M. Ravindra, Phys. Stat. Sol. B, 100 (1980) 715

-[33] Y. Al-Douri, Mater. Chem. Phys. 82 (2003) 49

-[34] Y. Al-Douri, Y. P. Feng, A. C. H. Huan, Solid State Commun. 148 (2008) 521

-[35] P. Herve, L. K. J. Vandamme, Infrared Phys. Technol. 35 (1993) 609

-[36] D. R. Penn, Phys. Rev. 128 (1962) 2093

-[37] J. A. Van Vechten, Phys. Rev. 182 (1969) 891

-[38] G. A. Samara, Phys. Rev. B 27 (1983) 3494

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Published

2019-01-15

How to Cite

Kadir, D., Benoi, A., & Delon, S. (2019). Characterization and analysis of GaN. Experimental and Theoretical NANOTECHNOLOGY, 3(1), 33–43. https://doi.org/10.56053/3.1.33

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